Study of low frequency noise in High Voltage MOS transistor

dc.contributor.advisorBucher Matthiasen
dc.contributor.advisorBucher Matthiasel
dc.contributor.authorFellas Konstantinosen
dc.contributor.authorΦελλας Κωνσταντινοςel
dc.contributor.committeememberBalas Costasen
dc.contributor.committeememberΜπαλας Κωσταςel
dc.contributor.committeememberKoutroulis Eftychiosen
dc.contributor.committeememberΚουτρουλης Ευτυχιοςel
dc.date.accessioned2024-10-31T16:13:49Z
dc.date.available2024-10-31T16:13:49Z
dc.date.issued2014
dc.date.submitted2014-10-07
dc.descriptionΔιπλωματική εργασία που παραδώθηκε στην σχολή ΗΜΜΥ Πολυτεχνείου Κρήτης για απόκτηση πτυχίουel
dc.description.abstractHVMOSFETs find many different applications such as switching applications, input-output operations, voltage conversions, RF amplification etc. The effect of drift region on 1/f noise remained unclear until recently due to the difficulty of performing 1/f noise measurements under high drain voltages, on the order of tens of Volt. This is mainly due to the lack of adequate measurement equipment, which usually restricts low frequency noise to be measured up to just a few Volt, usually generated from batteries. A 1/f noise parameter extraction method for high-voltage (HV-)MOSFETs at 3V drain bias is presented in this thesis. In this region the overall noise is mostly dominated by the noise originating in the channel. The bias dependence of flicker noise, related to transconductance-to-current ratio, allows for an easy means to determine related noise parameters. Though measured data is limited, parameters related to carrier number fluctuation effect may be found. 50 V N and P-channel HV-MOSFETs are investigated for long as well as short channel lengths. The parameter extraction method is applied to a recently established 1/f noise model for HV-MOSFETs, showing a good agreement among model and experimental data.en
dc.format.extent43 pagesen
dc.identifier10.26233/heallink.tuc.22870
dc.identifier.citationKonstantinos Fellas, "Study of low frequency noise in High Voltage MOS transistor", Diploma Work, School of Electronic and Computer Engineering, Technical University of Crete, Chania, Greece, 2014en
dc.identifier.citationΚωνσταντίνος Φελλάς, "Study of low frequency noise in High Voltage MOS transistor", Διπλωματική Εργασία, Σχολή Ηλεκτρονικών Μηχανικών και Μηχανικών Υπολογιστών, Πολυτεχνείο Κρήτης, Χανιά, Ελλάς, 2014el
dc.identifier.urihttps://dspace.library.tuc.gr/handle/123456789/1061
dc.language.isoen
dc.publisherΠολυτεχνείο Κρήτηςel
dc.publisherTechnical University of Creteen
dc.relation.replaces8355
dc.rightshttp://creativecommons.org/licenses/by/4.0/en
dc.subjectMOSFETen
dc.subjectmetal oxide semiconductor field effect transistorsen
dc.subjectmosfeten
dc.titleStudy of low frequency noise in High Voltage MOS transistoren
dc.typeΔιπλωματική Εργασίαel
dc.typeDiploma Worken
dcterms.mediatorTechnical University of Crete::School of Electronic and Computer Engineeringen
dcterms.mediatorΠολυτεχνείο Κρήτης::Σχολή Ηλεκτρονικών Μηχανικών και Μηχανικών Υπολογιστώνel
dspace.entity.typePublication

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